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6inch 8inch 12inch LPCVD Oxidation Furnace For Uniform Thin-Film Deposition

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Product Details
Brand Name: ZMSH
Model Number: LPCVD Oxidation Furnace
Certification: rohs
Place of Origin: CHINA
Minimum Order: 2
Price: by case
Payment Terms: T/T
Delivery Time: 5-10months
Wafer size: 6/8/12 inch wafer
Compatible Materials: Polycrystalline silicon, silicon nitride, silicon oxide
Oxidation: Dry oxygen/Wet oxygen (DCE, HCL)
Process temperature range: 500°C-900°C
Temperature control accuracy: ±1°C
Application: Power semiconductors, Substrate materials
Description
Abstract of LPCVD Oxidation Furnace 6inch 8inch 12inch LPCVD Oxidation Furnace for Uniform Thin-Film Deposition LPCVD (Low Pressure Chemical Vapor ...

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